The QX500-2/D is an ultrahigh vacuum magnetron sputtering unit, which is used to sputter metals and dielectric films from 65 mm targets, including: Cu, Cr, W, Ti, Ta, Al, Si, SiC and Si₃N₄. The QX500-2/D is also capable of reactive sputtering with both nitrogen and oxygen gas feeds at the target position. With two power supplies, co-sputtering is possible. Either RF or DC magnetron sputtering can be used depending on the target requirements.